Tan, Ing Hwie, Ueda, Mario, Dallaqua, Renato, Rossi, José Osvaldo, Beloto, Antonio Fernando, Demarquette, Nicole Raymonde et Gengembre, Leon.
2005.
« Aluminum implantation in Kapton® for space applications: magnetic field effects on implantation in vacuum arcs ».
Japanese Journal of Applied Physics, vol. 44, nº 1, part 7A.
pp. 5211-5215.
Compte des citations dans Scopus : 10.
Rechercher dans Google Scholar
Official URL: http://dx.doi.org/10.1143/JJAP.44.5211
Item Type: | Peer reviewed article published in a journal | ||
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Affiliation: | Autres | ||
Date Deposited: | 22 Jul 2015 21:27 | ||
Last Modified: | 22 Jul 2015 21:27 | ||
URI: | https://espace2.etsmtl.ca/id/eprint/10056 |
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