Tahan, Antoine et Levesque, Sylvain.
2009.
« Exploiting the process capability of position geometric tolerance according GD & T ASME Y14.5M ».
In International Conference on Computers and Industrial Engineering (CIE) (Troyes, France, July 6-9, 2009)
pp. 1267-1272.
Piscataway, NJ, USA : Institute of Electrical and Electronics Engineers Computer Society.
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Official URL: http://dx.doi.org/10.1109/ICCIE.2009.5223885
| Item Type: | Conference proceeding |
|---|---|
| ISBN: | 9781424441365 |
| Professor: | Professor Tahan, Antoine |
| Affiliation: | Génie mécanique |
| Date Deposited: | 30 Oct 2012 18:19 |
| Last Modified: | 14 Sep 2017 14:24 |
| URI: | https://espace2.etsmtl.ca/id/eprint/3118 |
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