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Freestanding nanostructures via reactive ion beam angled etching

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Atikian, Haig A., Latawiec, Pawel, Burek, Michael J., Sohn, Young-Ik, Meesala, Srujan, Gravel, Normand, Kouki, Ammar B. et Lončar, Marko. 2017. « Freestanding nanostructures via reactive ion beam angled etching ». APL Photonics, vol. 2, nº 5.
Compte des citations dans Scopus : 15.

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Abstract

Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk polycrystalline and single crystal diamond. Reported quality factors are approximately 30 000 and 286 000, respectively. The devices show uniformity across 25 mm samples, a significant improvement over comparable techniques yielding freestanding nanostructures.

Item Type: Peer reviewed article published in a journal
Additional Information: Identifiant de l'article: 051301
Professor:
Professor
Kouki, Ammar B.
Affiliation: Génie électrique
Date Deposited: 15 May 2017 19:15
Last Modified: 22 Jan 2020 20:00
URI: https://espace2.etsmtl.ca/id/eprint/15255

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