Ar/Cl2 etching of GaAs optomechanical microdisks fabricated with positive electroresist

Benevides, Rodrigo, Ménard, Michaël, Wiederhecker, Gustavo S. and Alegre, Thiago P. Mayer. 2020. « Ar/Cl2 etching of GaAs optomechanical microdisks fabricated with positive electroresist ». Optical Materials Express, vol. 10, nº 1. pp. 57-67.
Compte des citations dans Scopus : 9.

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Item Type:	Peer reviewed article published in a journal
Professor:	Professor Ménard, Michaël
Affiliation:	Autres
Date Deposited:	16 Aug 2023 18:28
Last Modified:	16 Aug 2023 18:28
URI:	https://espace2.etsmtl.ca/id/eprint/27357

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