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Ar/Cl2 etching of GaAs optomechanical microdisks fabricated with positive electroresist

Benevides, Rodrigo, Ménard, Michaël, Wiederhecker, Gustavo S. and Alegre, Thiago P. Mayer. 2020. « Ar/Cl2 etching of GaAs optomechanical microdisks fabricated with positive electroresist ». Optical Materials Express, vol. 10, nº 1. pp. 57-67.
Compte des citations dans Scopus : 4.

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Item Type: Peer reviewed article published in a journal
Professor:
Professor
Ménard, Michaël
Affiliation: Autres
Date Deposited: 16 Aug 2023 18:28
Last Modified: 16 Aug 2023 18:28
URI: https://espace2.etsmtl.ca/id/eprint/27357

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