TEOS-PECVD films for high-quality SiO2 cladding layers in Si3N4-photonics with low mechanical stress and optical loss

Mehrvar, Leila, Drogoff, Boris Le, Menard, Michael and Chaker, Mohamed. 2024. « TEOS-PECVD films for high-quality SiO2 cladding layers in Si3N4-photonics with low mechanical stress and optical loss ». In Photonics North (PN) (Vancouver, BC, Canada, May 28-30, 2024) Institute of electrical and Electonics Engineers Inc..
Compte des citations dans Scopus : 3.

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Item Type:	Conference proceeding
ISBN:	2693-8316
Professor:	Professor Ménard, Michaël
Affiliation:	Génie électrique
Date Deposited:	10 Sep 2025 15:03
Last Modified:	10 Sep 2025 15:03
URI:	https://espace2.etsmtl.ca/id/eprint/31763

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